The Astron 2L comes partially assembled, but the gantry requires attention.
: Specifically designed for 100% NF3 process gas feed using ISO KF40 inlet/outlet connections.
If you’ve just unboxed your , or if you’re considering adding this workhorse to your resin printing farm, you’ve probably realized one thing: this machine is built for efficiency, but it requires a specific workflow to get perfect results.
stresses the mandatory installation of sensitive gas detectors Transport Geometry: mks astron 2l manual
The (Model AX7657-85) is a high-performance Remote Plasma Source (RPS) designed for reactive gas generation in semiconductor manufacturing. This specialized equipment is primarily used for NF3 dissociation to clean process chambers. Core Technical Specifications
is designed as an integrated module, combining the power source, control module, and plasma chamber into a single compact unit. Specification AX7651 / AX7657 series Cooling Water-cooled: ~2.0 gpm flow at < 30°C Input Voltage 180 to 228 VAC, 50/60 Hz, 3 Phase (typical for series) Control Interface 9-pin and 25-pin D-sub connectors Ignition Gas 100% Argon (Ar) required for plasma ignition only Process Gas Up to 6 slm of NF3cap N cap F sub 3 (post-ignition) Wetted Materials Hardcoat anodized Aluminum, Alumina, Chemraz® Installation Guide
Check Ar gas pressure, water flow, and vacuum levels. The Astron 2L comes partially assembled, but the
A: Technically, yes. The 0-10 V output on the rear panel can drive a digital panel meter. However, the front meter’s logarithmic response is non-linear; a digital voltmeter reading requires the formula above.
. This "remote" method is widely preferred in industry because it reduces damage to the expensive components inside the main CVD chamber compared to in-situ cleaning MKS Instruments Key Technical Specifications Model Number AX7651-2 (ASTRON 2L) Approximately 52 kg (115 lbs) Primary Use Chamber cleaning and reactive gas production MKS Instruments Cleaning Agent Typically Nitrogen Trifluoride ( cap N cap F sub 3
MKS Astron 2L (also known as the AX7651 or AX7657) is a Remote Plasma Source (RPS) primarily used in semiconductor manufacturing to clean cap C cap V cap D (Chemical Vapour Deposition) and cap F cap P cap D and vacuum levels. A: Technically
ASTRON AX7680 Series Manual : Provides detailed installation and safety instructions for similar reactive gas generators.
: Post-ignition operating pressure should be maintained between 1 to 10 Torr Dissociation
Verify setpoint relay operations against an independent master gauge.
MKS ASTRON® 2L is a remote toroidal plasma source designed for high-flow reactive gas generation, specifically optimized for cap N cap F sub 3